Tabletop Plasma Cleaner

Tergeo-EM Plasma Cleaner

Gatan Solarus and Fischione Plasma cleaner for Electron Microscope samples

Tergeo-EM plasma cleaner from (PIE Scientific LLC, Silicon Valley, USA) is a tabletop plasma cleaner designed to remove contamination from SEM and TEM samples. Pin-mount SEM sample holders are placed on internal quartz plate for cleaning. This model can accept two TEM sample rods from different vendors.

Tergeo-EM plasma cleaner is the only TEM/SEM plasma cleaner that has integrated immersion mode plasma cleaning (samples placed in plasma) and downstream mode plasma cleaning (samples placed outside plasma).

– —Immersion mode plasma cleaning can be used for photoresist ashing, PDMS/ MEMS device surface modification, medical device treatment, etc.

– —Downstream mode plasma cleaning can be used for fragile sample treatment, such as holey carbon grid for TEM samples, heat and ESD sensitive devices, graphene, etc.

In addition, this system is equipped with unique pulsed mode operation that can generate extremely short plasma pulses to reduce the plasma intensity for delicate samples. Tergeo-EM plasma cleaner uses patented plasma sensor technology that can monitor the strength of plasma in real-time and helps the user to set up specific cleaning recipes for different samples.

Remote Plasma Cleaners

The EM-KLEEN and SEMI-KLEEN remote plasma cleaners were designed on the principles of inductively coupled plasma (ICP) discharge technology developed at the Lawrence Berkeley National Laboratory. The patent pending Turbo Discharge™ technology further improves the plasma strength by as much as 3X compared with traditional ICP discharge technology.

EM-KLEEN Remote Plasma Cleaner

XEI Scientific Evactron Plasma cleaner for SEMEM-KLEEN plasma cleaner system is ideal to clean samples and/or chambers of Scanning Electron Microscope (SEM), Focussed Ion Beam (FIB), Transmission Electron Microscope (TEM), X-ray Photoelectron Spectroscope (XPS), Secondary Ion Mass Spectrometer (SIMS), Sensitive High Resolution Ion Micro Probe (SHRIMP) and other vacuum-based analytical instruments.

» No need to vent the SEM / FIB / HIM /XPS chamber to air

» No need to slow down or turn off turbo pump

» Unique plasma strength sensor monitors plasma status in real-time. Users are not blind to plasma status anymore!

» Automatic electronic gas flow control. No need to manually adjust needle valve.

» Recipes and cleaning schedules

EM-KLEEN plasma cleaner is equipped with pressure sensor, automatic gas flow controller, plasma strength sensor, temperature sensor, cooling fan, LCD touch screen controller with embedded micro-computer and a remote plasma source. Remote plasma source should be installed on the vacuum chamber to be cleaned. Standard vacuum interface port NW/KF40 flange and adapters for different SEM ports are available.

Evactron Plasma decontaminator for vacuum chamber with Gatan SolarusSEMI-KLEEN remote plasma cleaner is designed to meet the tough requirements from semiconductor industry. It can be used on Electron Beam Review system (EBR), Electron Beam Inspection system (EBI), Critical Dimension Scanning Electron Microscope (CD-SEM), Electron Beam Lithography system (EBL), EUV Lithography (EUVL) and EUV mask inspectors.

Besides all the standard hardware features on EM-KLEEN plasma cleaners, such as pressure sensor, automatic gas flow controller, plasma strength sensor, temperature sensor, cooling fan and LCD touchscreen controller, SEMI-KLEEN plasma cleaner also integrates the latest plasma source design technologies from semiconductor industry to reduce particle generation risk. Low particulate design on SEMI-KLEEN plasma cleaner has been qualified by semiconductor capital equipment manufacturers and it outperforms competition by multiple orders of magnitude. Standard SEMI-KLEEN plasma cleaner uses high purity quartz tube with external antennas. It can be used to generate air, O2, Ar+O2, H2 and Ar+H2 plasma at low pressure. Proprietary antenna design reduces plasma potential, thus reducing ion sputtering on the source chamber. In addition, chamber materials have been carefully selected to withstand plasma etching. Combined with proprietary dual stage particle filtering technology, SEMI-KLEEN remote plasma cleaner has met the toughest PWP requirement from customers like Intel, Samsung and TSMC.

EM-KLEEN Remote Plasma Cleaner on JEOL 7800F FESEM, Zeiss FESEM, FEI Helios FIB-SEM and Tescan LYRA FIB-SEM:

Evactron Plasma Cleaner on JEOL 7800F FESEM with Fischione plasmaIBSS Plasma Cleaner on Zeiss Merlin FESEM

IBSS Plasma Cleaner on FEI Helios FIB SEMEvactron Plasma Cleaner on Tescan LYRA FIB SEM