EM-KLEEN Remote Plasma Cleaner
PIE Scientific EM-KLEEN: an automatic remote plasma source that removes hydrocarbon contamination from SEM, FIB, TEM, XPS and SIMS chambers and samples.
Key features
- Chamber and samples
- Removes hydrocarbon and fluorocarbon contamination from the chamber and samples together.
- Instruments
- SEM, FIB and TEM from Zeiss, JEOL, FEI, Hitachi and TESCAN, plus XPS, SIMS and ALD systems.
- Fast
- Inductively coupled quartz plasma source; PIE reports 3–5× faster cleaning than competitors.
- Automatic
- Ignites reliably at low pressure, electronic gas flow control and a plasma intensity sensor.
- Recipes and scheduling
- 60 stored recipes and SmartSchedule for unattended cleaning.
- Shared instruments
- Safe and expert modes, a portable controller and remote PC control.
Specifications
From PIE Scientific's product page.
| RF power | 0–75 W in 1 W steps |
|---|---|
| RF frequency | 13.56 MHz |
| Recipes | 60 |
| Vacuum interface | NW/KF40 flange standard; CF 2.75 in optional |
| Pressure sensor | Integrated Pirani |
| Controller | Touchscreen with embedded microcomputer |
| Remote control | RS232, RS485 |
| Certification | TÜV Rheinland to UL, CSA and IEC 61010-1; CE |
