Remote Plasma Decontaminator
The remote plasma decontaminators from (PIE Scientific LLC, Silicon Valley, USA) were designed on the principles of inductively coupled plasma (ICP) discharge technology developed at the Lawrence Berkeley National Laboratory. Patent-pending Turbo Discharge™ technology further improves the plasma strength by as much as 3X compared with traditional ICP discharge technology.
Our remote plasma decontaminators are ideal to remove hydrocarbon contamination from chambers of Scanning Electron Microscope (SEM), Focussed Ion Beam (FIB), Transmission Electron Microscope (TEM), X-ray Photoelectron Spectroscope (XPS), Secondary Ion Mass Spectrometer (SIMS), Sensitive High Resolution Ion Micro Probe (SHRIMP), Electron Beam Review system (EBR), Electron Beam Inspection system (EBI), Critical Dimension Scanning Electron Microscope (CD-SEM), Electron Beam Lithography system (EBL), EUV Lithography (EUVL) and EUV mask inspectors and other vacuum-based analytical instruments.
SmartClean™ technology developed by PIE Scientific combines the most advanced plasma discharge technology in nuclear research and the semiconductor industry. EM-KLEEN and Semi-KLEEN plasma cleaners are far more advanced than previous generations of plasma cleaners. Our plasma cleaner can beat competitors on any specification. In addition, many unique features are only available on our products.
Key Benefits:
» No need to vent the chamber to air
» No need to slow down or turn off TMP
» Unique plasma strength sensor monitors plasma status in real-time. Users are not blind to plasma status anymore!
» Automatic electronic gas flow control. No need to manually adjust needle valve.
» Recipes and cleaning schedules
SEMI-KLEEN and EM-KLEEN series plasma cleaner provide a gentle plasma cleaning solution for contamination control in high vacuum systems, such as SEM, FIB, AES, XPS, ALD, EUVL, etc. It consists of a controller and a remote plasma source. A remote plasma source should be installed on the vacuum chamber to be cleaned. The controller provides the RF power to the remote plasma source. It breaks down the process gas such as oxygen, hydrogen, or other gas mixtures and generates reactive radicals. Radical species will then diffuse into the chamber to be cleaned and react with the contaminants. The byproducts are usually low molecule weight, high vapor pressure molecules that can be easily pumped away. Remote plasma cleaner can clean vacuum systems and samples at the same time. Option to support aggressive and sometimes corrosive plasma such as H2, NF3, CF4, NH3 is available.
NanoTechnology Solutions supplies, installs and supports whole range of PIE Scientific LLC products and accessories across Australia and New Zealand. Contact us to discuss your specific requirements and integration into your existing instrumentation.
Remote Plasma Decontaminator on JEOL 7800F FESEM, Zeiss FESEM, FEI Helios FIB-SEM and Tescan LYRA FIB-SEM:
