KLA Instruments’ Alpha-Step stylus profilers deliver high-precision 2D and 3D surface metrology, measuring step height, surface roughness, bow, stress and other challenging analyses by generating reliable, precise data with industry-leading stability and reliability.
Nano Technology Solutions is the exclusive distributor of KLA Instruments and supplies, installs, supports surface metrology products and accessories across Australia and New Zealand. We have KLA factory-trained engineers on these metrology products and can guide you on the right configuration suitable for your research needs.
Contact us to discuss your specific requirements and applications.
Since the launch of the Alpha-Step 100 stylus profilometer in 1977, KLA’s technical experts have continued to bring key innovations such as advanced topography sensors, ultra-flat scanning stages, and fully automated measurement capability to market. KLA’s tools continue to evolve, providing repeatable and accurate measurements for your surface metrology requirements. Learn more about the rich history of innovation of KLA stylus profilers.
The Alpha-Step® D-500 and D-600 are the latest generation of the Alpha-Step stylus profilers. The innovative Optical Lever sensor technology offers high-resolution measurements, a large vertical range, and low-force measurement capability. The profilers can measure features up to 1.2mm in height or depth with a 0.38Å z resolution in the lowest vertical range. The Alpha-Step combines time-tested technical capability with the smallest system footprint for a benchtop stylus profiler. It is very easy to use, allowing any user to quickly generate measurement data with minimal training.
Advantages
- Excellent repeatability and reproducibility
- Direct, material-independent measurements
- Low force control for measuring soft materials
- Keystone correction removes distortion due to side-view optics
- Arc correction compensates for the arc motion of the stylus
- Manual 140mm stage (200 mm stage in D-600) and advanced optics with enhanced video controls
Applications
- 2D scanning of surface topography: Measure 2D step heights from nanometres to 1200 μm. Used to quantify the material deposited or removed during etch, sputter, SIMS, deposition, spin coating, CMP, and measurements on soft materials.
- 3D Step Height (exclusive to D-600): Measure 3D step heights from nanometres to 1200 μm. Used to quantify hole and trench depth or map surface topography variation and feature structure.
- Roughness and waviness of smooth and rough texture: Measure 2D texture while quantifying and distinguishing the sample’s roughness and waviness components using software filters.
- Bow and radius of curvature: Measure the 2D shape by stitching multiple scans (up to 30 mm with D-500 and 200 mm with D-600). Wafer bow resulting from layer mismatch, for example, during the deposition of multiple layers in the production of semiconductor or compound semiconductor devices. Quantify the height and radius of curved structures, such as a lens.
- Thin film stress using Stoney’s equation: Measure 2D stress induced during the manufacture of semiconductor devices having multiple process layers. The bow of the sample is accurately measured using a stress chuck to support the sample in a neutral position, and the change in shape is used to calculate the stress by applying Stoney’s equation.
The Alpha-Step stylus profiler is designed for universities, research labs, and institutes, ideal for R&D and low-volume, pilot production lines. Examples include measurements of textile security features and roughness correlating to absorbency of the textile. Consumer electronics applications include measurement of touch screen topography and measurement of thin-film step heights on glass screens. The operator can quickly focus and measure at multiple locations on the sample to map any process variation across the sample surface. Alpha-Step software also supports tracking of the user, system, and lot information to support production statistical process control.
Primary applications in the semiconductor industry include monitoring film deposition, lithography, pre- and post-etch depth, Chemical-Mechanical Planarisation (CMP), post-CMP topography, roughness, and sample bow and stress, for improved production process control. Critical to CMP development applications is the stylus profiler’s ability to create three-dimensional images to monitor local as well as global Planarisation effects. Example process steps include BAW and SAW device etch and CMP, via etch steps, and copper and gold packaging steps.
The data storage industry uses stylus profilers to monitor hard disk surface roughness, quantify hard disk roll-off (including chamfer angle and depth), thin film head bar roughness, and thin film head pole tip recession. For optimised repeatability in measuring hard disk fine roughness, it is critical to use a small radius of curvature stylus, 0.1 – 0.2 μm, as well as the low stylus forces delivered by KLA Instruments profilers, to avoid scratching the surface.
Alpha Stylus Profilers are also used to measure SIMS (Secondary Ion Mass Spectrometry) crater depth and roughness of the bottom surface with high precision to determine ion concentration as a function of crater depth and process uniformity.
For information on the Hardware and Software features of Alpha-Step D-Series Profilers, click here.